简介：Asphericalmaskforthefabricationofmicrolensarrayswaspreparedbymelt-ingphotoresist,andthesphericalphotoresistshapewastransferredintoasiliconsubstrateusingionbeammilling.TheionbeammillingprocesswascomputersimulatedusingtheSig-mundionbeamsputteringtheoryofcollisioncascades.Theexperimentresultsshowthatmi-crolensarrayscanbeeffectivelyformedatlowsubstratetemperatureoflessthan200℃，Shapesanddimensionsofphotoesistmasksandsiliconmicrolensarrayswereexaminedbythescanningelectronmicroscopeandtestedbythesurfacestylusmeasurement.
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